Technique to create a buried plate in embedded dynamic random access memory device

ABSTRACT

A method for forming a trench structure is provided for a semiconductor and/or memory device, such as an DRAM device. In one embodiment, the method for forming a trench structure includes forming a trench in a semiconductor substrate, and exposing the sidewalls of the trench to an arsenic-containing gas to adsorb an arsenic containing layer on the sidewalls of the trench. A material layer is then deposited on the sidewalls of the trench to encapsulate the arsenic-containing layer between the material layer and sidewalls of the trench.

BACKGROUND

The present disclosure generally relates to the field of fabricatingdynamic random access memory (DRAM) devices, such as embedded DRAMdevices.

Embedded DRAM devices may include trench capacitors. A trench capacitoris a three dimensional device that can be formed by etching a trenchinto a semiconductor substrate. After trench etching, a buried plateelectrode, also referred to as a diffusion plate, is typically formedabout the exterior portion of the trench and a node dielectric is thenformed on the inner walls of the trench. Next, the trench is filled, forexample, with doped polysilicon, such as N-type polycrystalline silicon(“N-type Poly-Si”). The doped poly-Si serves as one electrode of thecapacitor, often referred to as the upper electrode or storage node, andthe buried plate electrode serves as a second electrode of thecapacitor, often referred to as the lower electrode. A node dielectricseparates the buried plate and the upper electrode, and serves as theinsulating layer of the trench capacitor.

SUMMARY

A method for forming a trench structure is provided for a semiconductorand/or memory device, such as an embedded DRAM device. In oneembodiment, the method for forming a trench structure includes forming atrench in a semiconductor substrate, and exposing the sidewalls of thetrench to an arsenic-containing gas to deposit an arsenic containinglayer on the sidewalls of the trench. A material layer is then formed onthe sidewalls of the trench to encapsulate the arsenic-containing layerbetween the material layer and the sidewalls of the trench.

In another embodiment, a method of forming a trench capacitor isprovided that includes forming a trench in a semiconductor substrate andexposing the sidewalls of the trench to an arsenic-containing gas todeposit an arsenic-containing layer on the sidewalls of the trench. Amaterial layer is then formed on the sidewalls of the trench toencapsulate the arsenic between the material layer and sidewalls of thetrench. The arsenic from the arsenic-containing layer is driven into thesemiconductor substrate to form a lower plate electrode. A nodedielectric can be formed on the lower plate electrode. The trench may befilled with an upper electrode.

In another aspect, a memory device is provided that includes a trenchpresent in a semiconductor substrate. A capacitor is present in thetrench that includes a buried plate electrode having a uniform arsenicconcentration throughout an entirety of the buried plate electrode. Apass transistor is in electrical communication with the capacitor.

DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWINGS

The following detailed description, given by way of example and notintended to limit the disclosure solely thereto, will best beappreciated in conjunction with the accompanying drawings, wherein likereference numerals denote like elements and parts, in which:

FIG. 1 is a flow chart illustrating the process flow of one embodimentof the present disclosure.

FIG. 2 is a side cross-sectional view depicting a semiconductor oninsulator substrate (SOI) substrate having a pad dielectric stackdisposed thereon, in accordance with the present disclosure.

FIG. 3 is a side cross-sectional view depicting forming an opening inthe pad dielectric stack, the SOI layer of the substrate, and the burieddielectric layer of the substrate, in accordance with one embodiment ofthe present disclosure.

FIG. 4 is a side cross-sectional view depicting forming a trench in thelower semiconductor layer of the SOI substrate, in accordance with oneembodiment of the present disclosure.

FIG. 5 is side cross-sectional views depicting widening the trench, inaccordance with one embodiment of the present disclosure.

FIG. 6 is a side cross-sectional view depicting forming asemiconductor-containing material on the sidewalls of the trench, inaccordance with one embodiment of the present disclosure.

FIG. 7 is a side cross-sectional view depicting forming anarsenic-containing layer on the sidewalls of the trench including thesemiconductor material, in accordance with one embodiment of the presentdisclosure.

FIG. 8 is a side cross-sectional view depicting forming a material layerto encapsulate the arsenic-containing layer between asemiconductor-containing layer and sidewalls of the trench, inaccordance with one embodiment of the present disclosure.

FIG. 9 is a side cross-sectional view depicting driving the arsenic fromthe arsenic-containing layer into the semiconductor substrate to form aburied plate electrode, in accordance with one embodiment of the presentdisclosure.

FIG. 10 is a side cross-sectional view depicting a memory device formedfrom the buried plate electrode depicted in FIG. 9, in accordance withone embodiment of the present disclosure.

DETAILED DESCRIPTION

Detailed embodiments of the present disclosure are disclosed herein;however, it is to be understood that the disclosed embodiments aremerely illustrative and may be embodied in various forms. In addition,each of the examples given in connection with the various embodimentsare intended to be illustrative, and not restrictive. Further, thefigures are not necessarily to scale, some features may be exaggeratedto show details of particular components. Therefore, specific structuraland functional details disclosed herein are not to be interpreted aslimiting, but merely as a representative basis for teaching one skilledin the art to variously employ the embodiments of the presentdisclosure.

References in the specification to “one embodiment”, “an embodiment”,“an example embodiment”, etc., indicate that the embodiment describedmay include a particular feature, structure, or characteristic, butevery embodiment may not necessarily include the particular feature,structure, or characteristic. Moreover, such phrases are not necessarilyreferring to the same embodiment. Further, when a particular feature,structure, or characteristic is described in connection with anembodiment, it is submitted that it is within the knowledge of oneskilled in the art to affect such feature, structure, or characteristicin connection with other embodiments whether or not explicitlydescribed. For purposes of the description hereinafter, the terms“upper”, “lower”, “right”, “left”, “vertical”, “horizontal”, “top”,“bottom”, and derivatives thereof shall relate to the embodiments of thedisclosure, as it is oriented in the drawing figures. The terms“overlying”, “atop”, “positioned on” or “positioned atop” means that afirst element, such as a first structure, is present on a secondelement, such as a second structure, wherein intervening elements, suchas an interface structure, e.g. interface layer, may be present betweenthe first element and the second element. The term “direct contact”means that a first element, such as a first structure, and a secondelement, such as a second structure, are connected without anyintermediary conducting, insulating or semiconductor layers at theinterface of the two elements.

The embodiments of the present disclosure relate to methods forproducing a buried plate electrode in a high aspect ratio (height towidth ratio) trench. A trench with a high aspect ratio is a trenchhaving an aspect ratio that is greater than 5:1. A buried plateelectrode is an electrode that is formed in the sidewalls and basesurfaces of the trench. The term “electrode” as used to describe acomponent of the capacitor represents one of at least two electricallyconductive materials of the capacitor that are separated by a dielectriclayer, e.g., node dielectric layer.

It has been determined that buried plate electrodes formed by depositingan arsenic-containing glass layer on the sidewalls of the trench anddiffusing the arsenic from the arsenic-containing glass layer into thesidewalls of the trench with an anneal, can not adequately providecoverage of the trench's entire sidewall in a high-aspect ratio trench.This is because the spin-on-glass methods that are used to deposit thearsenic-containing glass within the trench close the opening of highaspect ratio trenches prior to adequate coverage of base and sidewallsurfaces of the trench. Buried plate electrodes that are formed by ionimplantation are also deficient in introducing arsenic to the entiretyof the sidewalls of high aspect ratio trenches. Angled ion implantationcan not implant the upper portion of high aspect ratio trenches with thesame uniformity as the lower portion of the high aspect ratio trench,especially when interlevel dielectric layers are present on the surfaceof the substrate, in which the trench has been formed.

In one embodiment, the method of the present disclosure providescomplete coverage of the walls, i.e., base and sidewall surfaces, ofhigh aspect ratio trenches by applying an arsenic-containing layer tothe trench sidewalls with an arsenic-containing gas. Following theapplication of the arsenic-containing gas, a material layer (hereafterreferred to as an encapsulating layer) may be deposited encapsulatingthe arsenic between the sidewalls of the trench and the material layer.An anneal is performed to drive the arsenic into the sidewalls of thehigh aspect ratio trench. FIGS. 1-9 depict one embodiment of theaforementioned method. FIG. 1 is a flow chart illustrating the processflow of one embodiment of the present method. The process flowillustrated in FIG. 1 is for illustrative purposes only and is notintended to limit the disclosed method to the process steps listed,because preceding and intermediate process steps that are notillustrated in FIG. 1 have been contemplated and are within the scope ofthe present disclosure.

Referring to FIG. 1, and in some embodiments, the method may begin withthe step 15 of forming a pad dielectric stack 6 on a semiconductorsubstrate 1. FIG. 2 depicts a semiconductor substrate 1, e.g., SOIsubstrate. In one example, at least one dielectric layer, e.g., paddielectric stack 6, may be present on an upper surface of thesemiconductor substrate 1. In the example depicted in FIG. 2, thesemiconductor substrate 1 is a semiconductor on insulator (SOI)substrate including a first semiconductor layer 4 (hereafter alsoreferred to as a semiconductor on insulator (SOI) layer 4), such as asilicon-containing semiconductor layer, located on a surface of a burieddielectric layer 3, such as a buried oxide layer. The firstsemiconductor layer 4 typically has a thickness greater than 10 nm. Theburied dielectric layer 3 typically has a thickness ranging from 10 nmto 100 nm. In another embodiment, the buried dielectric layer 3 rangesfrom 20 nm to about 80 nm. Underlying the buried dielectric layer 3 is alower semiconductor layer, i.e., second semiconductor layer 2 (hereafteralso referred to as a base semiconductor layer 2), which may be composedof a Si-containing material, and may have a thickness ranging from 10 nmto 500 nm.

The SOI layer 4 and/or the base semiconductor layer 2 may include anysemiconductor material including, but not limited to; Si, Ge, SiGe,GaAs, InAs, InP, or other III/IV compounds. The SOI layer 4 and/or thebase semiconductor layer 2 may be doped with P or N-type dopants or maybe undoped. In particular, the SOI layer 4 and/or the base semiconductorlayer 2 may be lightly doped with P-type dopants, such as boron. The SOIlayer 4 and/or the base semiconductor layer 2 may contain variousisolation and/or active device regions. For clarity, such regions arenot shown in the drawings, but are nevertheless meant to be includedwithin the SOI layer 4 and/or the base semiconductor layer 2. The burieddielectric layer 3 may be any dielectric material, such as an oxide,nitride or oxynitride. In one example, the buried dielectric layer 3 iscomposed of silicon oxide.

The SOI substrate 1 may be formed using a bonding process, or it may beformed using an ion implantation process. In one embodiment, the SOIsubstrate can be a bonded substrate comprised of two semiconductorwafers that are bonded together. The two wafers used in fabricating thebonded substrate may include two SOI wafers, wherein one of the wafersincludes the SOI layer 4. One of the two wafers includes a dielectriclayer present thereon, which is to be positioned between the SOI layer 4and the base semiconductor layer 2 to provide the buried dielectriclayer 3 of the semiconductor (SOI) substrate. Bonding can be achieved byfirst bringing the two wafers into intimate contact with other,optionally applying an external force to the contacted wafers, and thenheating the two contacted wafers under conditions that are capable ofbonding the two wafers together. The heating step may be performed inthe presence or absence of an external force. In one embodiment, theheating step is typically performed in an inert ambient at a temperatureof from 600° to 1300° C. for a time period of from 2 to 20 hours. Inanother embodiment, the bonding is performed at a temperature of from900° to 1200° C. for a time period of from 2 hours to 20 hours. The term“inert ambient” is used herein to denote an atmosphere in which an inertgas, such as He, Ar, N₂, Xe, Kr or a mixture thereof, is employed.

Although the semiconductor substrate 1 depicted in FIG. 2 is an SOIsubstrate, the semiconductor substrate 1 may be a bulk semiconductorsubstrate. The bulk semiconductor substrate may be any semiconductormaterial including, but not limited to, Si, Ge, SiGe, GaAs, InAs, InP,or other III/IV compounds.

The pad dielectric stack 6 includes at least one dielectric layer. Thepad dielectric stack 6 may be formed on the surface of the semiconductorsubstrate 1 using deposition and/or thermal growth processes. The paddielectric stack 6 can serve as an etch mask during formation of atleast one trench in the semiconductor substrate 1. The pad dielectricstack 6 may comprise a single pad dielectric layer, or the paddielectric stack 6 may comprise a multi-layered structure. For example,the pad dielectric stack 6 may comprise an oxide, a nitride, or a dopedsilicate glass material, or two or more of the aforementioned materialsmay be employed.

In the example depicted in FIG. 2, the pad dielectric stack 6 includes afirst pad dielectric layer 7, e.g., a pad oxide layer, a second paddielectric layer 8, e.g., a pad nitride layer, and a third paddielectric layer 9, e.g., a high density plasma (HDP) chemical vapordeposition (CVD) deposited oxide. When the first pad dielectric layer 7is composed of a pad oxide layer, the pad oxide layer may be siliconoxide having a thickness ranging from 1 nm to 10 nm. When the second paddielectric layer 8 is composed of a pad nitride layer, the pad nitridelayer may be silicon nitride having a thickness ranging from 10 nm to200 nm. When the third pad dielectric layer 9 is composed of HDPCVDoxide, the HDPCVD oxide may be silicon oxide having a thickness rangingfrom 10 nm to 1500 nm.

Referring to FIGS. 1 and 3, in a following step 10, a opening 11 isetched through the pad dielectric stack 6 into the SOI substrate, i.e.,semiconductor substrate 1, stopping on the base semiconductor layer 2.Referring to FIG. 3, the pad dielectric stack 6 can be patterned usinglithography and etching. A photolithographic mask (not shown) isproduced, by applying a photoresist layer (not shown) on the exposedsurface layer of the surface to be etched utilizing a conventionaldeposition process. The photoresist layer is then patterned utilizingconventional lithography so as to expose selective regions of the padstack in which trenches are to be formed. The lithography step includesexposing the photoresist to radiation to form a pattern in thephotoresist and developing the pattern. The pattern (not shown) is thentransferred into the layer of the pad dielectric stack 6 using aconventional etching process, such as reactive-ion etching (RIE), ionbeam etching, or plasma etching that is highly selective in removing padmaterial as compared to photoresist.

FIG. 3 depicts forming at least one opening 11 through the paddielectric stack 6 and the SOI layer 4 and the buried dielectric layer 3of the semiconductor substrate 1. In one embodiment, the opening 11 isfirst formed in the pad dielectric stack 6 to expose a portion, i.e.,exposed portion, of the semiconductor substrate 1, i.e., SOI substrate.Thereafter, the exposed portion of the semiconductor substrate 1 isetched. Although, FIG. 3 depicts etching through the SOI layer 4 and theburied dielectric layer 3 stopping on the upper surface of the basesemiconductor layer 2, embodiments are contemplated where the opening 11is provided by etching through the SOI layer 4 and through the uppersurface of the base semiconductor layer 2.

The opening 11 may be formed using an etch process, such as ananisotropic etch process. As used herein, an “anisotropic etch process”denotes a material removal process in which the etch rate in thedirection normal to the surface to be etched is higher than in thedirection parallel to the surface to be etched. Etching of the at leastone opening 11 into the SOI layer 4 of the semiconductor substrate 1 maybe performed using a timed etch process step that is highly selective inremoving the material of the SOI layer 4 of semiconductor substrate 1,as opposed to the material of the pad dielectric stack 6. Dry etchingprocesses that may be used to form the at least one opening 11 include,but are not limited to reactive ion etch, ion-beam etching, plasmaetching or any other like dry etch process. Reactive ion etching (RIE)is a form of plasma etching in which during etching the surface to beetched is exposed to reactive gases in the presence of an RF field.During RIE the surface to be etched takes on a potential thataccelerates the reactive species extracted from a plasma toward thesurface, in which the chemical etching reaction is taking place in thedirection normal to the surface.

A combination of the aforementioned dry etch processes may also be usedin providing the at least one trench opening 11. In one embodiment, afirst etch gas may remove the SOI layer 4 selective to the burieddielectric layer 3, wherein a second etch gas may remove the burieddielectric layer 3 selective to the base semiconductor layer 2. Thewidth W₁ of each opening 11 may range from 30 nm to 250 nm. Moretypically, the width W₁ of each opening 11 may range from 50 nm to 200nm. In one example, the width W₁ of each opening 11 is on the order of100 nm.

Referring to FIGS. 1 and 3, in some embodiments, in a following step 15,a spacer 12 is formed on the sidewalls of the trench opening 11. Thespacer 12 may be formed on the exposed sidewall of the SOI layer 4. Thespacer 12 may be composed of a dielectric material such as a nitride,oxide, oxynitride or multilayers and combinations thereof. In oneexample, the spacer 12 can be composed of silicon nitride. The spacer 12may be formed using a deposition process that forms a conformal layer onthe deposition surface, i.e., sidewalls and base of the opening 11. Asused herein, “conformal layer” is a deposited material having athickness that remains the same regardless of the geometry of underlyingfeatures on which the layer is deposited, wherein the thickness of thelayer does not deviate from greater than or less than 20% of an averagevalue for the thickness of the layer. In one example, the material layerthat provides the spacer 12 may be deposited using chemical vapordeposition (CVD). Chemical vapor deposition (CVD) is a depositionprocess in which a deposited species is formed as a result of a chemicalreaction between gaseous reactants at greater than room temperature,wherein solid product of the reaction is deposited on the surface onwhich a film, coating, or layer of the solid product is to be formed.Variations of CVD processes suitable for providing the material layerfor the spacer 12 include, but are not limited to, Atmospheric PressureCVD (APCVD), Low Pressure CVD (LPCVD), Plasma Enhanced CVD (EPCVD),Metal-Organic CVD (MOCVD), and combinations thereof. In one embodiment,the material layer that provides the spacer 12 can be deposited on thesidewalls and the base of the trench. The portion of the material layerthat provides the spacer 12 that is formed on the base may be removed byan etch process, such as an anisotropic etch, so that the remainingportion of the material layer that provides the spacer 12 is onlypresent on the trench 13 sidewalls. In one embodiment, the anisotropicetch process that removes the base portion of the material layer thatprovides the spacer 12 is a reactive ion etch process. In anotherembodiment, the spacer 12 is provided on the exposed sidewall of the SOIlayer 4 using a thermal oxidation process. In this embodiment, in whichthe SOI layer 4 is composed of silicon, the spacer 12 is composed ofsilicon oxide. The width of each spacer 12 may range from 1 nm to 25 nm.In one example, the width of each spacer 12 ranges from 5 nm to 20 nm.

Referring to FIGS. 1 and 4, in a following step 20, the opening 11 isextended into the base semiconductor layer 2 of the semiconductorsubstrate 1, i.e., SOI substrate, to provide a trench 13. FIG. 4 depictsone embodiment of forming the trench 13 in the base semiconductor layer2 of the semiconductor substrate 1, i.e., SOI substrate. In oneembodiment, the trench 13 is an extension of the opening 11 into thebase semiconductor layer 2 of the semiconductor substrate 1. Etching ofthe trench 13 into the base semiconductor layer 2 of the semiconductorsubstrate 1 may be performed using a timed etch process step that ishighly selective in removing the material of the base semiconductorlayer 2 of semiconductor substrate 1 as opposed to the material of thepad dielectric stack 6. Dry etching processes that may be used to formthe trench 13 include, but are not limited to: RIE, ion-beam etching,plasma etching or any other like dry etch process. A combination of theaforementioned dry etch processes may also be used in providing thetrench 13.

In one embodiment, the final depth H₁ of each trench 13, as measuredfrom the top surface of the second semiconductor layer 2 is as great as10 μm. The final depth H₁ trench 13, as measured from the top surface ofthe second semiconductor layer 2 of the semiconductor substrate 1, mayalso range from 1 μm to 7 μm. In one example, the final depth H₁ is onthe order of about 3 μm. The aspect ratio (height to width ratio) of thetrench 13 may range from 25:1 to 100:1. Even more typically, the aspectratio ranges from 30:1 to 70:1.

Referring to FIGS. 1 and 5, and in some embodiments, in a followingoptional step 25, the trench 13 may be widened. FIG. 5 depictsisotropically etching the trench 13, in which the isotropic etchincreases at least the width of the trench 13 in the base semiconductorlayer 2. More specifically, the isotropic etch increases the width W₁ ofthe trench 13 provided by the anisotropic etch and opening 11 that isdescribed with reference to FIG. 3 to an enlarged width W₃ as depictedin FIG. 5. As opposed to anisotropic etch processes, an isotropic etchis not directional. In one embodiment, the isotropic etch that providesthe enlarged width W₃ in the trench 13 may be referred to as a “bottleetch”, which provides a trench 13 having a bottle shape. Suchbottle-shaped trenches can be formed by an isotropic etch process whichselectively removes semiconductor material in the lower region of thetrench 13 but not the opening 11 at the upper region of the trench 13.In the present case, the isotropic etch removes the material of the basesemiconductor layer 2 selective to the pad dielectric stack 6 and theburied dielectric layer 3. In one embodiment, the sidewall of the SOIlayer 4 is protected during the isotropic etch by the spacer 8 that ispresent on the etched sidewalls of the SOI layer 4.

In one embodiment, the base semiconductor layer 2 is isotropicallyetched with a composition including hydrofluoric acid (HF) and ammoniumhydroxide (NH₄OH) to obtain the bottle-shaped trench having an enlargedwidth W₃. In another embodiment, the base semiconductor layer 2 isisotropically etched to obtain a bottle-shaped trench having an enlargedwidth W₃. In one embodiment, the width W₃ of the trench 13 is enlargedto be greater than the width W₁ of the opening 11. In one example, theenlarged width W₃ of the trench 13 may range from 50 nm to 200 nm. Inanother example, the enlarged width W₃ of the trench 13 may range from100 nm to 150 nm. It is noted that the widening of the trench 13 isoptional, and may be omitted from the process flow of the presentdisclosure.

Referring to FIGS. 1 and 6, and in some embodiments, in a following step30, a semiconductor-containing material 14 is deposited on the sidewallsof the trench 13 within at least the base semiconductor layer 2 of thesemiconductor substrate 1, i.e., SOI substrate. The deposition of thesemiconductor-containing material 14 is optional, and may be omittedfrom the process sequence disclosed herein.

FIG. 6 depicts one embodiment of forming a semiconductor-containingmaterial 14 on the sidewalls of the trench 13. Thesemiconductor-containing material 14 may be any semiconductor including,but not limited to, Si, Ge, SiGe or combinations thereof. In oneembodiment, the semiconductor-containing material 14 is asilicon-containing material, such as silicon or silicon germanium. Thesemiconductor-containing material 14 may be deposited using chemicalvapor deposition (CVD). Variations of CVD processes suitable fordepositing the semiconductor-containing material 14 include, but are notlimited to, Atmospheric Pressure CVD (APCVD), Low Pressure CVD (LPCVD),Plasma Enhanced CVD (EPCVD), Metal-Organic CVD (MOCVD), and combinationsthereof.

In one example, in which the semiconductor-containing material 14 issilicon, the semiconductor-containing material 14 may be deposited froma semiconductor-containing gas that includes, but is not limited to,silicon tetrachloride, dichlorosilane (SiH₂Cl₂), and silane (SiH₄). Inone embodiment, the flow rate of the semiconductor-containing gas rangesfrom 100 sccm to 1000 sccm. In another embodiment, the flow rate of thesemiconductor-containing gas ranges from 200 sccm to 800 sccm. Thesemiconductor-containing gas is typically applied to the sidewalls ofthe trench 13 while the structure is at a temperature greater than 400°C. In one embodiment, the temperature of the structure containing thetrench 13 is heated to a temperature ranging from 450° C. to 700° C. Inanother embodiment, the structure containing the trench 13 is heated toa temperature ranging from 525° C. to 575° C. The structure can beheated by a thermal furnace or oven.

The thickness of the semiconductor-containing material 14 deposited onthe sidewalls of the trench 13 by the semiconductor-containing gastypically ranges from 5 Å to 50 Å. In another embodiment, the thicknessof the semiconductor-containing material 14 that is deposited on thesidewalls of the trench 13 ranges from 10 Å to 30 Å. In yet anotherembodiment, the thickness of the semiconductor-containing material 14deposited on the sidewalls of the trench 13 ranges from 10 Å to 20 Å. Inone example, the semiconductor-containing material 14 that is depositedon the sidewalls of the trench 13 is silicon that is deposited fromsilane gas, wherein the thickness of the silicon ranges from 10 Å to 20Å. The above process variables are illustrative of one form of batchchemical vapor deposition (CVD) equipment. The above variables may bemodified in response to changes in the deposition equipment. Forexample, the deposition method that forms the semiconductor-containingmaterial 14 may be a single wafer chemical vapor deposition tool.

Referring to FIGS. 1 and 7, and in a following step 35, anarsenic-containing layer 16 may be formed on thesemiconductor-containing material 14. In the embodiments, in which thesemiconductor-containing material 14 has been omitted, thearsenic-containing layer 16 may be formed on the sidewalls of the trench13. By formed it is meant that an arsenic-containing layer 16 may beadsorbed onto the deposition surface. Adsorption is the process ofattraction of atoms or molecules from an adjacent gas, e.g.,arsenic-containing gas, to an exposed solid surface, e.g., thesemiconductor-containing material 14 or the sidewalls of the trench 13.The attraction forces, e.g., van der Waals forces, align the moleculesinto layers, e.g., monolayers, onto the surface on which the material isbeing formed. In one example, at least one of van der Walls forcesinitiate the initial attraction of the adsorbed species, wherein ionicor metallic forces may bond the new monolayers to the surface on whichthe material is being adsorbed. For example, an arsenic-containing gasmay form a monolayer of arsenic that is adsorbed to the surface on whichthe monolayer is formed, in which the monolayer includes atoms ofarsenic that are bonded to silicon atoms of the surface of thesemiconductor-containing material 14 or the sidewalls of the trench 13.

FIG. 7 depicts one embodiment of forming an arsenic-containing layer 16that is adsorbed on the sidewalls of the trench 13 that thesemiconductor-containing material 14 is present on. In some embodiments,the semiconductor-containing material 14 that is present on thesidewalls of the trench 13 increases the adhesion of thearsenic-containing layer 16 to the sidewalls of the trench 13, incomparison to similar structures in which the semiconductor-containingmaterial 14 is not present. As indicated above, thesemiconductor-containing material 14 is optional and may be omitted, inwhich the arsenic-containing layer 16 is adsorbed directly to thesidewalls of the trench 13.

The arsenic-containing layer 16 typically includes a monolayer ofarsenic. In one embodiment, the monolayer of arsenic may be a layer thatis composed of single atoms of arsenic, in which each of atoms in themonolayer has been adsorbed to an atom of the surface on which themonolayer has been formed. For example, each of the atoms of arsenic inan arsenic monolayer may be adsorbed to a single silicon atom of thesidewall of the trench 13. The arsenic atoms tie to the surface atoms ofthe exposed silicon. In another example, in which asemiconductor-containing material 14 has been deposited on the trench 13sidewalls, each of the atoms of arsenic in an arsenic monolayer may beadsorbed to a single silicon atom of the semiconductor-containingmaterial 14. The arsenic-containing layer 16 may be approximately 100%arsenic. In one embodiment, the arsenic-containing layer 16 may includemultiple layers of arsenic, in which the arsenic monolayers that areformed after the initial arsenic monolayer that is adsorbed to thesidewalls of the trench 13 (or the optional semiconductor-containingmaterial 14) are adsorbed to the preceding arsenic monolayer.

Examples of arsenic-containing gasses that are suitable for depositingthe arsenic-containing layer include arsine (AsH₃). In one embodiment,the flow rate of the arsenic-containing gas ranges from 80 sccm to 500sccm. In another embodiment, the flow rate of the arsenic-containing gasranges from 100 sccm to 300 sccm. The arsenic-containing gas istypically applied to the sidewalls of the trench 13 (or the optionalsemiconductor-containing material 14), while the structure is at atemperature greater than 400° C. In one embodiment, the temperature ofthe structure containing the trench 13 is heated to a temperatureranging from 450° C. to 600° C. In another embodiment, the structurecontaining the trench 13 is heated to a temperature ranging from 525° C.to 575° C. The structure can be heated by a thermal furnace or oven.

The thickness of the arsenic-containing layer 16 deposited by thearsenic-containing gas typically ranges from 5 Å to 30 Å. In anotherembodiment, the thickness of the arsenic-containing layer 16 that isadsorbed on the sidewalls of the trench 13, or adsorbed on thesemiconductor-containing material 14, ranges from 10 Å to 25 Å. Inanother embodiment, the thickness of the arsenic-containing layer 16 hasa thickness that ranges from 10 Å to 20 Å. In one example, thearsenic-containing layer 16 is adsorbed from an arsine gas, wherein thethickness of the arsenic ranges from 10 Å to 20 Å. In one embodiment,the arsenic-containing layer has an arsenic concentration ranging from1×10¹⁸ atoms/cm³ to 1×10²¹ atoms/cm³. In another embodiment, thearsenic-containing layer has an arsenic concentration ranging from1×10¹⁹ atoms/cm³ to 1×10²° atoms/cm³.

Referring to FIGS. 1 and 8, in a following step 40, an encapsulatinglayer 17 is deposited on the arsenic-containing layer 16. FIG. 8 is aside cross-sectional view depicting depositing a material layer on thesidewalls of the trench 13 that the arsenic-containing layer 16 ispresent on to encapsulate the arsenic-containing layer 16 between theencapsulating layer 17 and the sidewalls of the trench 13. By“encapsulate” it is meant that the material of the encapsulating layer17 is deposited over the entire surface of the arsenic-containing layer14, so that the arsenic of the arsenic-containing layer 14 is containedwithin the trench 13. In some embodiments, by encapsulating thearsenic-containing layer 14 outdiffusion of the arsenic is substantiallyeliminated, which allows for the trench structure including thearsenic-containing layer 14 to be removed from the thermal furnacewithout introducing arsenic to the ambient atmosphere.

In one embodiment, the encapsulating layer 17 is composed of arsenicsilicate glass. The silicate glass may be deposited to provide anencapsulating layer 17 with a conformal deposition process such as,e.g., chemical vapor deposition, plasma enhanced chemical vapordeposition, atomic layer deposition, and combinations thereof. In oneexample, an encapsulating layer 17 composed of arsenic doped silicateglass (ASG) may have an arsenic content ranging from 2 wt. % to 10 wt %.

In another embodiment, the encapsulating layer 17 is composed of anoxide, such as silicon oxide. The silicon oxide may be formed byreacting silicon containing gas precursors with an oxygen-containing gasprecursor in a chemical vapor deposition (CVD) method. In oneembodiment, the silicon-containing gas precursor may be silane, and theoxygen-containing gas precursor may be nitrous oxide. Variations ofchemical vapor deposition (CVD) processes suitable for depositing anoxide, e.g., silicon oxide, encapsulating layer 17 include, but are notlimited to, Atmospheric Pressure CVD (APCVD), Low Pressure CVD (LPCVD),Plasma Enhanced CVD (EPCVD), Metal-Organic CVD (MOCVD), and combinationsthereof.

In yet another embodiment, the encapsulating layer 17 is composed of athermal oxide. The thermal oxide may be an arsenic-containing oxide thatis formed by introducing oxygen to the arsenic-containing layer 14 usingan annealing step in an oxygen-containing atmosphere. In one example,the anneal temperature ranges from 800° C. to 1150° C. In yet anotherexample, the anneal temperature ranges from 800° C. to 1150° C. In someembodiments, the anneal drives arsenic from the arsenic-containing layer16 into the sidewalls of the trench 13 to form a buried plate electrode18, as depicted in FIG. 8.

Referring to FIG. 7, in an even further embodiment, the encapsulatinglayer 17 is formed by depositing a silicon-containing layer and thenthermally oxidizing the silicon-containing layer to provide an oxide,such as silicon oxide. The silicon-containing layer may be depositedusing chemical vapor deposition. Variations of chemical vapor deposition(CVD) processes suitable for depositing an oxide, e.g., silicon oxide,encapsulating layer 17 include, but are not limited to, AtmosphericPressure CVD (APCVD), Low Pressure CVD (LPCVD), Plasma Enhanced CVD(EPCVD), Metal-Organic CVD (MOCVD), and combinations thereof. In oneexample, the silicon-containing layer is silicon that is deposited usinga silicon-containing gas precursor, such as silane. Thermal oxidation ofthe silicon-containing layer may be provided by an annealing step in anoxygen-containing atmosphere. In one example, the anneal temperatureranges from 800° C. to 1150° C. In yet another example, the annealtemperature ranges from 800° C. to 1150° C. In some embodiments, theanneal drives arsenic from the arsenic-containing layer 16 into thesidewalls of the trench 13 to form a buried plate electrode 18, asdepicted in FIG. 8.

Referring to FIG. 7, the thickness of the encapsulating layer 17deposited on the arsenic-containing layer 16 typically ranges from 5 Åto 30 Å. In another embodiment, the thickness of the encapsulating layer17 deposited on the arsenic-containing layer 16 ranges from 10 Å to 25Å. In another embodiment, the thickness of the encapsulating layer 17deposited on the arsenic-containing layer 16 ranges from 10 Å to 20 Å.

In the embodiments, in which an anneal step has been applied that formsan oxide and drives the arsenic from the arsenic-containing layer 16into the sidewalls of the trench 13, the oxide may be removed by aselective etch process. The etch process for removing the oxide may beselective to the arsenic doped sidewalls of the trench 13 (including theoptional silicon-containing material 14). By removing the oxide from thetrench 13, a greater trench width is maintained, which facilitates thedeposition of material layers within the trench 13 in the followingprocess sequences. In one example, the selective etch is provided byhydrofluoric acid (HF).

Although FIG. 8 depicts a single arsenic-containing layer 16 and aencapsulating layer 17 deposited in the trench 13, it is noted thatmulti-layers of the arsenic-containing layer 16 and the encapsulatinglayer 17 may also be formed within the trench. To provide a multiplelayers of the arsenic-containing layer 16 and the encapsulating layer17, the sequence of depositing the arsenic-containing layer 16 and theencapsulating layer 17 may be repeated.

Referring to FIG. 1, at this step 45 of the process flow, it isdetermined whether the desired arsenic concentration has been depositedwithin the trench 13. Arsenic concentration depends upon the amount ofarsenic that is deposited in the arsenic-containing layer 16. Thethickness of the arsenic-containing layer 16 and the number of arseniccontaining layers 16, e.g., arsenic-containing monolayers, affect theconcentration of arsenic that is deposited in the trench 13. When asingle deposition of the arsenic-containing layer 16 does not provide asufficient concentration of arsenic, the steps 35 and 40 of depositingthe arsenic-containing layer 16 and the encapsulating layer 17 may berepeated. It is noted that in some embodiments, any number ofarsenic-containing layers 16 and encapsulating layers 17 may bedeposited in the trench 13 so long as a node dielectric and upperelectrode may also be deposited in the trench 13 when the trenchstructure is a capacitor.

Referring to FIGS. 1 and 8, in some embodiments, in which the arsenicfrom the arsenic-containing layer 16 was not driven into the trenchsidewalls during the formation of the encapsulating layer 17, once thedesired arsenic concentration has been deposited in the trench 13, theprocess flow continues at step 50 by driving the arsenic from thearsenic-containing layers 16 into the sidewalls of the trench 13 withinthe base semiconductor layer 2 of the semiconductor substrate 1 toprovide the buried plate electrode 18. In one embodiment, the arsenic isdriven from the arsenic-containing layers 16 into the sidewalls of thetrench 13 using an anneal, such as a thermal anneal, rapid thermalanneal, furnace anneal or laser anneal. In one embodiment, thetemperature of the anneal that drives the arsenic from thearsenic-containing layer 16 into the sidewalls of the trench 13 rangesfrom 750° C. to 1200° C. In another embodiment, the temperature of theanneal that drives the arsenic from the arsenic-containing layer 16 intothe sidewalls of the trench 13 ranges from 800° C. to 1150° C. In yetanother embodiment, the temperature of the anneal that drives thearsenic from the arsenic-containing layer 16 into the sidewalls of thetrench 13 ranges from 850° C. to 1100° C. The width of the buried plateelectrode 18 may range from 25 nm to 100 nm, as measured from thesidewall of the trench 13. In one example, the width of the buried plateelectrode 18 has a thickness of about 50 nm, as measured from thesidewall of the trench 13.

The anneal that drives the arsenic from the arsenic-containing layer 16into the sidewalls of the trench 13 can form an oxide on the sidewallsof the trench 13. The oxide may be removed by a selective etch process.The etch process for removing the oxide may be selective to the arsenicdoped sidewalls of the trench 13 (including the optionalsilicon-containing material 14). By removing the oxide from the trench13, a greater trench width is maintained, which facilitates thedeposition of material layers within the trench 13 in the followingprocess sequences. In one example, the selective etch is provided byhydrofluoric acid (HF).

The concentration of the arsenic in the buried plate electrode 18 mayrange from 1×10¹⁸ atoms/cm³ to 1×10²¹ atoms/cm³. In contrast to methodsthat utilize arsenic doped glass or ion implantation to form a buriedplate electrode, the buried plate electrode 18 that is produced by thepresent method has a uniform dopant concentration throughout theentirety of the sidewalls and base of the trench 13. More specifically,the concentration of the arsenic at the upper surface U1 of the trench13 sidewall, e.g., at the interface of the buried dielectric layer 3 andthe base semiconductor layer 2, is equal to the concentration of thearsenic at the base surface B1 of the trench 13. By “uniform dopantconcentration” it is meant that the concentration of arsenic in theburied plate electrode 18 is substantially uniform across the entiredepth of the buried plate electrode 18.

The buried plate electrode 18 depicted in FIG. 9 may be employed in acapacitor structure. A “capacitor” is a structure including twoelectrically conductive materials separated and insulated from eachother by a dielectric for storing a charge. The electrically conductivematerial of the capacitor includes the electrodes, such as the buriedplate electrode 18. One example of a capacitor structure that is formedfrom the buried plate electrode 8 is depicted in FIG. 10. FIG. 10depicts only one embodiment of a device that can be formed from themethod depicted in FIGS. 1-9, and is not intended to limit the presentdisclosure.

Referring to FIG. 10, a conformal dielectric layer is formed on theburied plate electrode 18 to provide a node dielectric 19 of thecapacitor that is formed within the trench 13. The “node dielectriclayer” is the dielectric layer that is present between the electrodes ofthe capacitor. The conformal dielectric layer employed at this stage maybe any dielectric material including, but not limited to, Si₃N₄, SiO₂,Al₂O₃, ZrO₂, and HfO₂. In one embodiment, the conformal dielectric layermay have a thickness of from 4.0 nm to 10.0 nm. The conformal dielectriclayer may have a thickness of from 2.5 nm to 7.0 nm, with a thickness offrom 3.0 nm to 5.0 nm being more typical.

The node dielectric 19 is conformally deposited on the sidewalls andbase of the trench 13 or directly on a conformal metal nitride layer. Inone embodiment, the node dielectric 19 may be deposited using chemicalvapor deposition (CVD). Variations of CVD processes suitable forproviding the node dielectric include, but are not limited to:Atmospheric Pressure CVD (APCVD), Low Pressure CVD (LPCVD), PlasmaEnhanced CVD (EPCVD), Metal-Organic CVD (MOCVD), atomic layerdeposition, and combinations thereof. In one example, the nodedielectric 19 is deposited using atomic layer deposition. In anotherembodiment, the node dielectric 19 is formed using a growth process,such as thermal oxidation.

Following the formation of the node dielectric 19, an upper electrode 21is formed atop the node dielectric 19. The upper electrode 21 iscomposed of a conductive material, such as doped polysilicon or a metal.In one embodiment, the conductive material of the upper electrode 21 maybe comprised of polysilicon, doped polysilicon, titanium nitride (TiN),tantalum nitride (TaN), tantalum silicon nitride (TaSiN), tungstennitride (WN) or a combination thereof. In the embodiments in which theconductive material is provided by doped polysilicon, the dopant may bean n-type or p-type dopant having a dopant concentration ranging from1×10¹⁸ atoms/cm³ to 1×10²⁰ atoms/cm³. The conductive material for theupper electrode 21 may be deposited using physical vapor deposition(PVD), such as plating or sputtering, or may be deposited using chemicalvapor deposition (CVD). The upper electrode 21 is deposited to fill thetrench 13 and the opening.

In one example, the upper electrode 21 is composed of a first layer thatis present on the node dielectric 19 that is composed of a metalnitride, such as titanium nitride, and a fill material that is formed onthe metal nitride, such as doped polysilicon. Following deposition, theconductive material of the upper electrode 21 may be recessed into thetrench 13, in some instances below an upper surface of the burieddielectric layer 3. In one example, in which the upper electrode 19includes a metal nitride layer and a doped polysilicon fill, the dopedpolysilicon fill may be recessed with an anisotropic etch process, suchas reactive ion etch (RIE). After recessing the polysilicon fill, anetch process that is selective to the doped polysilicon and the nodedielectric 19 removes the exposed portion of the metal nitride layer.

In a following process sequence, the node dielectric 19 that extendsabove the recessed conductive material of the upper electrode 21 isremoved from the sidewalls of the first semiconductor layer 4 thatprovides the trench. In one embodiment, the step of etching the nodedielectric 19 includes a wet etch process.

Thereafter, a doped polysilicon region 23 (also referred to as strapregion) is formed atop the recessed conductive material of the upperelectrode 21, which provides for electrical communication between theupper electrode 21 of the trench memory device and the subsequentlyformed pass transistors 60. In some examples, the upper surfaced of thedoped polysilicon region 23 is recessed relative to the upper surface ofthe first semiconductor layer 4.

In one embodiment, prior to forming the doped polysilicon region 23, thespacer 12 is removed from at least one side of the SOI layer 4. In oneexample, the spacer 12 is removed using an anisotropic etch process incombination with an etch mask. For example, a photolithographic mask(not shown) may provide an etch mask by applying a photoresist layer(not shown) on the surface to be etched utilizing a deposition process.The photoresist layer is then patterned utilizing lithography so as toexpose selected regions to be etched. In one embodiment, thephotolithographic mask is formed overlying a portion of the spacer 12 onone side of the trench 13, wherein a remaining portion of the spacer 12is not underlying the photolithographic mask and may be exposed. The paddielectric stack 6 may be removed by selective etch or chemical stripmethods. In this embodiment, in which the pad dielectric stack 6 hasbeen removed prior to the removal of a portion of the spacer 12, theetch process step removes the exposed portion of the spacer 12, whereinthe portion of the spacer 12 that is underlying the photolithographicmask is protected from the etch process and remains. The etching processfor removing the spacer 12 may include reactive-ion etching (RIE), ionbeam etching, plasma etching or laser ablation.

In another embodiment, the pad dielectric stack is removed after theportion of the spacer 12 has been removed. In this embodiment, the paddielectric stack may function as a hard mask. More specifically, thedifferent dielectric layers of the pad dielectric stack, in combinationwith the photolithography mask and selective etching may be utilized ina multi-stage etch process to remove the spacer 12 from one side of thetrench 13. In this embodiment, the portion of the pad dielectric stackoverlying the portion of the spacer 12 that is to be removed is etchedfirst to expose the spacer 12. Thereafter, the remaining portion of thepad dielectric stack functions as an etch mask while the exposed portionof the spacer 12 is removed. Following the removal of the portion of thespacer 12, the remaining layers of the pad dielectric stack may beremoved.

In a following process sequence, a doped polysilicon region 23 is formedin physical contact with the sidewall of the SOI layer 4 from which thespacer 12 was removed. In one embodiment, the doped polysilicon region23 is formed by first depositing a layer of polysilicon atop therecessed conductive material of the upper electrode 21, and then dopingthe polysilicon layer via ion implantation. The polysilicon layer may bedeposited using chemical vapor deposition (CVD). The polysilicon layerthat provides the doped polysilicon region 23 may then be doped by ionimplantation with an n-type or p-type dopant. A typical implant dose forproviding the doped polysilicon region 23 is from 1×10¹⁵ cm⁻² to 5×10¹⁶cm². A typical implant energy range for providing the doped polysiliconregion 23 is from 1 to 20 keV. In one embodiment, the doped polysiliconregion 23 provides for electrical communication between the upperelectrode 21 of the memory devices contained within the trench 13 andthe subsequently formed pass transistors 60.

Referring to FIG. 10, and in one embodiment, an isolation region 65 a,such as a trench top oxide (TTO), is formed overlying the trench memorydevices, e.g. trench capacitor. Forming the isolation region 65 a mayinclude an etch process to remove a portion of the doped polysiliconregion 23 followed by deposition of an insulating material, such as anoxide, nitride, or oxynitride material. It is noted that in addition tothe isolation region 65 a that is present overlying the trench memorydevice, e.g., trench capacitor, other isolation regions 65 b maysimultaneously be formed through the SOI layer 4.

Referring to FIG. 10, and in a following process sequence, passtransistors 60 are formed on the SOI layer 4 in electrical communicationwith the trench memory devices, e.g., trench capacitors. In oneembodiment, the pass transistors 60 are field effect transistors (FETs),such as n-type and/or p-type FETs. As used herein a “field effecttransistor” is a semiconductor device in which output current, i.e.,source-drain current, is controlled by the voltage applied to the gate.A field effect transistor has three terminals, i.e., gate, source anddrain.

Each field effect transistor (FET) may include a source region 61, adrain region 62, and a gate structure 63, in which a channel region 64is present underlying the gate structure 63 and is present between thesource region 61 and the drain region 62. Typically, the passtransistors 60 are planar devices, in which the length of the channel 64is parallel to the upper surface of the first semiconductor layer 7,e.g. SOI layer, in which the pass transistor 60 is formed. Typically, atleast one of the source region 61 and the drain region 62 of the passtransistors 60 are in electrical communication with the upper electrode21 of the trench memory device, e.g. trench capacitor, through the dopedpolysilicon region 23.

Referring to FIG. 10, the capacitor may be employed in a memory device.As used herein, the term “memory device” means a structure in which theelectrical state thereof can be altered and then retained in the alteredstate, in this way a bit of information can be stored. In oneembodiment, a memory device is provided that includes a semiconductor oninsulator (SOI) substrate (semiconductor substrate 1) including an SOIlayer 4 atop a buried dielectric layer 3, wherein the buried dielectriclayer 3 is overlying a base semiconductor layer 2; a capacitor 18, 19,21 present in a trench 13; and a pass transistor 60 present atop thesemiconductor on insulator (SOI) substrate is in electricalcommunication with the capacitor 18, 19, 21. The capacitor 18 includes aburied plate electrode 18 having a uniform arsenic concentrationthroughout the entire buried plate electrode 18.

While the present disclosure has been particularly shown and describedwith respect to preferred embodiments thereof, it will be understood bythose skilled in the art that the foregoing and other changes in formsand details may be made without departing from the spirit and scope ofthe present disclosure. It is therefore intended that the presentdisclosure not be limited to the exact forms and details described andillustrated, but fall within the scope of the appended claims.

1. A method of forming a trench structure comprising: forming a trenchin a semiconductor substrate; exposing sidewalls of the trench to anarsenic-containing gas to adsorb an arsenic containing layer on thesidewalls of the trench; depositing a material layer on the sidewalls ofthe trench to encapsulate the arsenic-containing layer between thematerial layer and sidewalls of the trench; and annealing to diffusearsenic from the arsenic-containing layer encapsulated by the materiallayer into the sidewalls of the trench. 2-4. (canceled)
 5. The method ofclaim 1, wherein the material layer is comprised of silicon oxide. 6.The method of claim 5, wherein the silicon oxide is deposited bychemical vapor deposition.
 7. The method of claim 6, wherein thematerial layer is formed by depositing a silicon containing layer andthermally oxidizing the silicon containing layer.
 8. (canceled)
 9. Themethod of claim 1, further comprising at least a second application ofarsenic containing gas to the material layer that is present on thesidewalls of the trench to form at least a second layer of arsenic; andat least another deposition of the material layer.
 10. The method ofclaim 9, wherein the annealing to diffuse the arsenic into the sidewallsof the trench is after a deposition of a final encapsulating materiallayer and is at a temperature greater than 1000° C.
 11. The method ofclaim 1, wherein the arsenic-containing gas is comprised of arsine. 12.The method of claim 11, wherein the arsenic-containing gas is applied tothe sidewalls of the trench at a flow rate ranging from 80 sccm to 500sccm.
 13. The method of claim 12, wherein the exposing of the sidewallsof the trench to the arsenic-containing gas occurs at a temperatureranging from 475° C. to 575° C.
 14. The method of claim 1, wherein thearsenic-containing layer comprises a monolayer of arsenic atoms.
 15. Themethod of claim 1, wherein the semiconductor substrate is asemiconductor on insulator substrate (SOI) substrate including ansemiconductor on insulating (SOI) layer on top of a dielectric layer,wherein the dielectric layer is on top of a base semiconductor layer.16. The method of claim 15, wherein the forming of the trench in thesemiconductor substrate comprises an anisotropic etch though thedielectric layer to a depth into the base semiconductor layer.
 17. Themethod of claim 8 wherein the annealing to diffuse the arsenic into thesidewalls of the trench provides a lower electrode.
 18. The method ofclaim 17, wherein the trench structure is an embedded dynamic randomaccess (eDRAM) memory device that comprises a node dielectric on thelower electrode and an upper electrode filling the trench.
 19. A methodof forming a trench capacitor comprising: forming a trench in asemiconductor substrate; exposing sidewalls of the trench to anarsenic-containing gas to adsorb an arsenic containing layer on thesidewalls of the trench; depositing a material layer on the sidewalls ofthe trench to encapsulate the arsenic between the material layer andsidewalls of the trench; driving the arsenic from the arsenic containinglayer encapsulated by the material layer into the semiconductorsubstrate to form a buried plate electrode; forming a node dielectric onthe buried plate electrode; and filling the trench with an upperelectrode.
 20. A memory device comprising: a trench present in asemiconductor substrate; a capacitor present in the trench, wherein thecapacitor includes a buried plate electrode having a uniform arsenicconcentration throughout an entirety of the buried plate electrode; anda pass transistor in electrical communication with the capacitor. 21.The method of claim 19, wherein prior to the exposing of the sidewallsof the trench to the arsenic-containing gas, a semiconductor material isdeposited on the sidewalls of the trench.
 22. The method of claim 19,wherein the semiconductor material has a thickness of 5 Å to 25 Å. 23.The method of claim 19, wherein the semiconductor material is asilicon-containing material that is deposited by a silane-containinggas.
 24. The method of claim 19 further comprising annealing to diffusearsenic from the arsenic-containing layer into the sidewalls of thetrench.